| 摘要 |
PURPOSE:To provide a titled device which enables the continuous formation of a thin film for a long time by the constitution wherein an electrode intalled near a base material to be deposited thereon with the thin film under the pressure reduced from the atmospheric pressure is moved continuously to renew the part of the working area for applicaton of bias potential properly. CONSTITUTION:A forming device for a thin film forms the thin film on a long- sized filmlike base material 41 moved by a transfer system 40 for the base material in the working region W regulated by the opening 51 of a shielding plate 50 by vapor-depositing the vapor deposition material 31 evaporated from an evaporating device 30 in a vacuum window vessel 10 provided with an evacuation system 20 on said base material in the vapor deposition region D of a cooling drum 43, wherein an electrode 64 connected to an electric power source 65 via a holder 61 is installed near the material 41 existing in the above-described region D to apply bias potential on siad material thereby improving the characteristic of the vapor-deposited film. Said electrode 64 is made movable by an electrode device 60, and the fresh electrode 64 is supplied from a spare electrode coil 63 provided in the outside of the region W to prevent the decrease in the function of the electrode 64 owing to the material 31, etc. |
