Verfahren zur Herstellung einer Solarzelle aus einer Substratscheibe

摘要

Through holes (4) are formed by electrochemical etching in a substrate wafer so that a perforated suspended layer (7) of n-doped monocrystalline silicon is formed. An n-doped region (10, 13) and a p-doped region (9) are produced in the suspended layer (7), which regions form a pn junction and both adjoin a first main face (2) of the suspended layer (7). A contact (15) to the n-doped region (13, 10) and a contact (14) to the p-doped region (9) are formed on the first main face (2), so that the pn junction can be connected up as a solar cell into which incident light can enter via a second main face (52) lying opposite the first main face.