发明名称 |
Uniform gas cushion wafer support |
摘要 |
A workpiece is supported on a gas cushion to reduce mechanical stresses on the workpiece during processing. A plenum having a workpiece support flange for receiving the workpiece is connected to a gas supply. When gas flows into the plenum and pressure increases sufficiently to lift the workpiece, the workpiece is lifted and the gas flows out of the plenum between the flange and the workpiece edge. The workpiece is thus supported above the flange by the gas during processing.
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申请公布号 |
US2005039685(A1) |
申请公布日期 |
2005.02.24 |
申请号 |
US20030646249 |
申请日期 |
2003.08.22 |
申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
EIRIKSSON ARI;GUELER RICHARD;PHARAND MICHEL |
分类号 |
H01L21/683;(IPC1-7):C23C16/00 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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