发明名称 |
ENERGY-CONSERVATION TYPE PHOTOMASK |
摘要 |
PURPOSE: To provide a mask capable of more deeply performing development with the same exposure energy. CONSTITUTION: This mask is provided with at least one or more first pattern areas 23 capable of transmitting an exposure source through the mask without diffracting it and a second pattern area where many auxiliary patterns 23' for performing the slit function of the exposure source are formed so as to diffract the exposure source and increase the exposure energy of the first area 23 but provide the energy incapable of developing a photosensitive film by the diffracted light. |
申请公布号 |
JPH07146545(A) |
申请公布日期 |
1995.06.06 |
申请号 |
JP19940153106 |
申请日期 |
1994.06.13 |
申请人 |
HYUNDAI ELECTRON IND CO LTD |
发明人 |
SAN MAN BAE |
分类号 |
G03F1/36;G03F1/70;G03F7/20;H01L21/02;H01L21/027 |
主分类号 |
G03F1/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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