发明名称 PROCESS FOR MEASURING THICKNESS OF VERY THIN MOVING FILMS
摘要 <p>PROCESS FOR MEASURING THICKNESS OF VERY THIN MOVING FILMS The thickness of very thin dielectric films covering metal surfaces are measured while the surface and the film are in motion. This is accomplished by spacing a prism very close to the moving film, passing light which is polarized in the plane of incidence into said prism at various angles of incidence to generate surface plasma oscillations on the film-metal layer interface and thereby attenuating reflectivity, then measuring said reflectivity as a function of the angle of incidence, determining that angle of incidence which produces the minimum reflectivity and comparing that angle of incidence to a previously determined standard to measure the film thickness. SA978069</p>
申请公布号 CA1127864(A) 申请公布日期 1982.07.20
申请号 CA19800348151 申请日期 1980.03.21
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人
分类号 G01B11/04;G01B11/06;G01N21/55 主分类号 G01B11/04
代理机构 代理人
主权项
地址