SAMPLE PLACING ELECTRODE AND PLASMA PROCESSING APPARATUS EMPLOYING SAME

摘要

PROBLEM TO BE SOLVED: To provide a temperature-controlled sample placing electrode employing a heater that is capable of increasing the ability to control electrode temperature, and maintaining overall uniformity in electrostatic absorption power. SOLUTION: The sample placing electrode 0113 provided in a processing chamber with a substrate 0112 to be processed disposed thereon, comprises a dielectric 0122 having a sample placing surface; an electrode thin film 0123 that is provided to face the sample placing surface across the dielectric 0122, and comprises a layer of substantially the same height that doubles as an electrostatic absorption electrode and a heater electrode; and a power source device capable of simultaneously supplying the electrode thin film 0123 with alternating-current power 0118 for the heater and direct-current power 0117 for electrostatic absorption. COPYRIGHT: (C)2007,JPO&INPIT