发明名称 |
POLYMER AND METHOD OF MANUFACTURING THE SAME, AND COMPOSITION FOR FILM FORMING INCLUDING THE SAME |
摘要 |
<p>PURPOSE: To provide a composition for film forming capable of baking in a short time, imparting a film having low dielectric constant excellent in heat resistance, adhesivity and resistance to cracking and a polymer and a method of manufacturing for the composition. CONSTITUTION: This polymer having a specific structure is obtained by reacting a specific dihalogen compound (e.g. 4,4'-bis(2-iodophenoxy) benzophenone) and a specific diethynyl compound (e.g. 4,4'-diethynyl diphenylether) in the presence of a catalyst. The composition for the film forming is obtained by dissolving the polymer in a solvent.</p> |
申请公布号 |
KR20020083467(A) |
申请公布日期 |
2002.11.02 |
申请号 |
KR20020022876 |
申请日期 |
2002.04.26 |
申请人 |
JSR CORPORATION |
发明人 |
EBISAWA MASAHIKO;NISHIKAWA MICHINORI;OKADA TAKASHI;SHINOHARA NORIYASU;SHIRATO KAORI;YAMADA KINJI |
分类号 |
C08J5/18;C08F38/02;C08G61/00;C08G61/02;C08G61/12;C09D165/00;C09D201/00;(IPC1-7):C08F38/02 |
主分类号 |
C08J5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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