发明名称 POLYMER AND METHOD OF MANUFACTURING THE SAME, AND COMPOSITION FOR FILM FORMING INCLUDING THE SAME
摘要 <p>PURPOSE: To provide a composition for film forming capable of baking in a short time, imparting a film having low dielectric constant excellent in heat resistance, adhesivity and resistance to cracking and a polymer and a method of manufacturing for the composition. CONSTITUTION: This polymer having a specific structure is obtained by reacting a specific dihalogen compound (e.g. 4,4'-bis(2-iodophenoxy) benzophenone) and a specific diethynyl compound (e.g. 4,4'-diethynyl diphenylether) in the presence of a catalyst. The composition for the film forming is obtained by dissolving the polymer in a solvent.</p>
申请公布号 KR20020083467(A) 申请公布日期 2002.11.02
申请号 KR20020022876 申请日期 2002.04.26
申请人 JSR CORPORATION 发明人 EBISAWA MASAHIKO;NISHIKAWA MICHINORI;OKADA TAKASHI;SHINOHARA NORIYASU;SHIRATO KAORI;YAMADA KINJI
分类号 C08J5/18;C08F38/02;C08G61/00;C08G61/02;C08G61/12;C09D165/00;C09D201/00;(IPC1-7):C08F38/02 主分类号 C08J5/18
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