| 摘要 |
PROBLEM TO BE SOLVED: To provide an electrodeposition dresser for polishing, adapted to be used for precise finish-up in a CMP process or the like, which can prevent abrasive grain from coming off, and which can uniformly set the heights of the tip ends of the abrasive grain so as to stabilize the polishing function after polishing. SOLUTION: In a manufacturing method in which an insulating sheet 7 having a thickness smaller than the grain size of abrasive grain and formed therein with several holes 7a having a size greater than the grain size of the abrasive grain and formed at intervals which are greater than 2 to 10 times as large as an averaged grain size of the abrasive grain is set on a level block 6. Abrasive grain 4 having a grain size in a range (between the maximum grain size and the minimum grain size) such as <=1.2 are set in the holes 7a one by one, and a basic material is set on the abrasive grain 4 with an electrodeposition surface of the base material being faced downward. In this condition, the abrasive grains 4 are tacked by Ni-plating 15a, and thereafter, the level block 6 and the insulating sheet 7 are removed, and then, the abrasive grains are again finally secured by plating. With this manufacturing method, an electrodeposition dresser for polishing is formed so that the space between the centers of adjacent abrasive grains is about 2 to 10 times as large as the averaged grain size of the abrasive grains, and the tip heights of the all abrasive grains after electrodeposition are within 5 μm. |
