发明名称 |
Surface acoustic wave device including first and second wiring electrodes crossing three-dimensionally |
摘要 |
A surface acoustic wave device includes, on a substrate, functional electrode units each including at least one IDT electrode, wiring electrodes connected to the functional electrode units, insulation films provided between the wiring electrode and the substrate, and a support member that surrounds the functional electrode units and at least a portion of the wiring electrodes. A thickness of the support member is larger than a thickness of the insulation films, and the insulation films and the support member are made of the same material. |
申请公布号 |
US9444427(B2) |
申请公布日期 |
2016.09.13 |
申请号 |
US201514882511 |
申请日期 |
2015.10.14 |
申请人 |
Murata Manufacturing Co., Ltd. |
发明人 |
Tsuda Motoji |
分类号 |
H03H9/10;H03H9/64;H03H9/02;H03H9/05;H03H9/145;H03H9/25 |
主分类号 |
H03H9/10 |
代理机构 |
Keating & Bennett, LLP |
代理人 |
Keating & Bennett, LLP |
主权项 |
1. A surface acoustic wave device comprising:
a substrate; a functional electrode unit located on the substrate and including at least one interdigital transducer (IDT) electrode; a wiring electrode that is connected to the functional electrode unit and is located on the substrate; an insulation film that is provided between a portion of the wiring electrode and the substrate; a support member that is provided on the substrate and surrounds the functional electrode unit and at least a portion of the wiring electrode; and a cover member that defines, along with the support member, a hollow space in which the functional electrode unit is located; wherein a thickness of the support member is larger than a thickness of the insulation film, and the insulation film and the support member are made of the same material; the wiring electrode includes a first wiring electrode and a second wiring electrode; a three-dimensional crossing section where the first wiring electrode and the second wiring electrode cross each other in a three-dimensional manner is provided; the support member is present above at least a portion of the second wiring electrode in the three-dimensional crossing section; the insulation film is located under the second wiring electrode in the three-dimensional crossing section; and the first wiring electrode is located under the insulation film. |
地址 |
Kyoto JP |