发明名称 Positiv arbeitendes strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial
摘要 The invention relates to a positive-acting radiation-sensitive mixture with: a) a compound which forms an acid under the effect of actinic radiation, b) a compound with at least one C-O-C- or C-O-Si bond which can be split by this acid and c) a polymeric binder which is insoluble in water but soluble or at least swellable by aqueous alkaline solutions, in which the compound (a) corresponds to the general formula: R<1>(-SO2-R<2>)n, in which R<1> is an n-valent (C1C3)alkane radical, R<2> are the same or different and are aryl, aralkyl, heteroaryl or heteroaralkyl radicals and n is a whole number from 2 to 4. The radiation-sensitive mixture of the invention has high resolution and great sensitivity over a wide spectral range. It also exhibits great thermal stability and does not form any corrosive photolysis products on exposure. The invention also relates to a radiation-sensitive recording material made therefrom which is suitable for making photoresists, electronic components and printing plates or for moulding etching.
申请公布号 DE4225830(A1) 申请公布日期 1994.02.10
申请号 DE19924225830 申请日期 1992.08.05
申请人 HOECHST AG, 65929 FRANKFURT, DE 发明人 WENGENROTH, HORST, DR., 5438 WESTERBURG, DE;SPIESS, WALTER, DR., 6110 DIEBURG, DE;BUHR, GERHARD, DR., 6240 KOENIGSTEIN, DE;ROESCHERT, HORST, DR., 6531 OBER-HILBERSHEIM, DE;PAWLOWSKI, GEORG, DR., 6200 WIESBADEN, DE;FUCHS, JUERGEN, 6093 FLOERSHEIM, DE
分类号 C08K5/42;C09D125/18;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/039;G03F7/075 主分类号 C08K5/42
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