摘要 |
The invention relates to a positive-acting radiation-sensitive mixture with: a) a compound which forms an acid under the effect of actinic radiation, b) a compound with at least one C-O-C- or C-O-Si bond which can be split by this acid and c) a polymeric binder which is insoluble in water but soluble or at least swellable by aqueous alkaline solutions, in which the compound (a) corresponds to the general formula: R<1>(-SO2-R<2>)n, in which R<1> is an n-valent (C1C3)alkane radical, R<2> are the same or different and are aryl, aralkyl, heteroaryl or heteroaralkyl radicals and n is a whole number from 2 to 4. The radiation-sensitive mixture of the invention has high resolution and great sensitivity over a wide spectral range. It also exhibits great thermal stability and does not form any corrosive photolysis products on exposure. The invention also relates to a radiation-sensitive recording material made therefrom which is suitable for making photoresists, electronic components and printing plates or for moulding etching.
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申请人 |
HOECHST AG, 65929 FRANKFURT, DE |
发明人 |
WENGENROTH, HORST, DR., 5438 WESTERBURG, DE;SPIESS, WALTER, DR., 6110 DIEBURG, DE;BUHR, GERHARD, DR., 6240 KOENIGSTEIN, DE;ROESCHERT, HORST, DR., 6531 OBER-HILBERSHEIM, DE;PAWLOWSKI, GEORG, DR., 6200 WIESBADEN, DE;FUCHS, JUERGEN, 6093 FLOERSHEIM, DE |