| 摘要 |
PROBLEM TO BE SOLVED: To suppress the flow of a resist by a step when a resist is applied on side walls of a recessed part on a substrate by forming one or more steps on the side walls and specifying the width of the steps. SOLUTION: A silicon substrate 10 as photoelectronic parts is provided with a recessed part 12 to house optical fibers or the like. For example, the silicon substrate 10 has a (100) plane direction and the recessed part 12 is constituted of side walls having a (111) plane direction. Steps 12A, 12A are provided on the side walls of the recessed part 12. By providing the steps 12A, 12A with >=0.2 μm width, the flow of a resist is suppressed. Namely, this prevents an irregular coating state and even when the recessed part 12 is steep, the resist can be applied so as to prevent an exposed part from being generated on the side wall. As the result, the shape of the recessed part can be stably maintained in the succeeding production processes and the production yield can be improved. |
