| 摘要 |
PROBLEM TO BE SOLVED: To provide a winding type vacuum film deposition system by which a mask pattern can be formed with high precision on the film deposition surface of a raw material film. SOLUTION: The system has: a vacuum chamber 11; an unwinding part 13 and a winding part 15 for a raw material film 12; a can roller 14 which comes into contact with the raw material film 12 and cools it; an evaporation source 16 for vapor depositing a metal film onto the raw material film 12; and a mask forming unit 20 which forms a mask pattern demarcating the vapor deposition area of the metal film. In the mask forming unit 20, a plate cylinder 32 for printing and applying the mask pattern on and to the raw material film 12 is constituted of a seamless sleeve printing plate. COPYRIGHT: (C)2006,JPO&NCIPI
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