摘要 |
Disclosed is a manufacturing method for an array substrate, comprising the steps of: A) forming gate electrodes, gate lines, a gate insulation layer, an active layer, data lines, source electrodes, drain electrodes, a first insulation layer and via holes on a substrate; B) forming common electrodes and a second insulation layer on the substrate subjected to step A) using a mask plate with slits, and forming penetrating holes in the second insulation layer; and C) forming metal electrodes, a third insulation layer and pixel electrodes on the substrate subjected to step B). The present invention completes manufacturing of common electrodes and a second insulation layer using one photoetching procedure, thus shortening the production time; therefore, the production efficiency is increased; and meanwhile, use of one mask plate is eliminated, and the production cost is reduced. |
申请人 |
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO.,LTD. |
发明人 |
ZHAN, WEI;SHEN, ZHIYUAN;DU, HAIBO;YU, XIAOJIANG;MING, XING |