发明名称 METHOD OF APPLYING PATTERN BY RADIATION INDUCTION
摘要 <p>PURPOSE: To deposit a pattern material by a single process of setting a layer contg. this material near a depositing surface, heating part of this layer to melt the pattern material and hardening it on the depositing surface. CONSTITUTION: A foil 18 contg. a pattern material is placed on a substrate 12 so as to be close to specified pattern forming surface 20 of the substrate 12, an optical system 22 with a laser is placed to disposed a fixed beam 23 to part of the surface 24 of the foil 18 and irradiates the beam 23 on the foil 18 to solidify the evaporated material between the foil 18 and substrate 12 on the surface 20 at a comparatively low temp. This eliminates the number of process steps.</p>
申请公布号 JPH0234916(A) 申请公布日期 1990.02.05
申请号 JP19890049707 申请日期 1989.03.01
申请人 TEXAS INSTR INC <TI> 发明人 ERIOTSUTO BUI KUTSUKU
分类号 G03F1/08;C23C16/04;C23F1/00;G03F7/20;H01C17/06;H01L21/027;H01L21/263;H01L21/268;H01L21/31;H01L21/3205;H01L21/82;H01L31/04;H05K3/10 主分类号 G03F1/08
代理机构 代理人
主权项
地址