PECVD of layers on nonmetallic substrates e.g. of plastics, elastomers, glass, ceramics or silicon

摘要

Plasma chemical deposition of layers on nonmetallic substrates is carried out by microwave introduction through the substrate (5) into a vacuum vessel (8). An Independent claim is also included for an apparatus for carrying out the above process, in which the substrate (5) is positioned directly on a microwave transparent window (17) in the vessel wall or forms part of the vessel wall.