发明名称 |
BENZANTHRONE POLYMERIZATION GATE IN PHOTOPOLYMERIZABLE COMPOSITIONS |
摘要 |
A light sensitive composition which is capable of photopolymerization which includes a photopolymerizable compound a free radical generating component and a benzanthrone or substituted benzanthrone which substantially prevents photopolymerization when the light sensitive composition is exposed to actinic radiation below a threshold amount but permits photopolymerization when the light sensitive composition is exposed to actinic radiation above a threshold amount. This achieves a gate effect which eliminates or decreases unwanted partial exposure in the nonimage areas and hence improves reproduction quality.
|
申请公布号 |
CA2169898(A1) |
申请公布日期 |
1996.08.25 |
申请号 |
CA19962169898 |
申请日期 |
1996.02.20 |
申请人 |
INTERNATIONAL PAPER COMPANY |
发明人 |
SYPEK, MARIA T.;DELUDE, JOHN R.;PERRON, PAUL A. |
分类号 |
G03F7/004;C08F2/50;G03F7/00;G03F7/021;G03F7/027;G03F7/038;G03F7/09;(IPC1-7):G03F7/028;G03F7/016 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|