发明名称 BENZANTHRONE POLYMERIZATION GATE IN PHOTOPOLYMERIZABLE COMPOSITIONS
摘要 A light sensitive composition which is capable of photopolymerization which includes a photopolymerizable compound a free radical generating component and a benzanthrone or substituted benzanthrone which substantially prevents photopolymerization when the light sensitive composition is exposed to actinic radiation below a threshold amount but permits photopolymerization when the light sensitive composition is exposed to actinic radiation above a threshold amount. This achieves a gate effect which eliminates or decreases unwanted partial exposure in the nonimage areas and hence improves reproduction quality.
申请公布号 CA2169898(A1) 申请公布日期 1996.08.25
申请号 CA19962169898 申请日期 1996.02.20
申请人 INTERNATIONAL PAPER COMPANY 发明人 SYPEK, MARIA T.;DELUDE, JOHN R.;PERRON, PAUL A.
分类号 G03F7/004;C08F2/50;G03F7/00;G03F7/021;G03F7/027;G03F7/038;G03F7/09;(IPC1-7):G03F7/028;G03F7/016 主分类号 G03F7/004
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