| 摘要 |
The invention is drawn to a method for preparing a laminate substrate for a light emitting device, said method comprising the following successive steps: (a) providing a glass substrate (1) having a refraction index, at 550 nm, of between 1.45 and 1.65, (b) coating a glass frit (3) comprising at least 30 weight % of Bi2O3 and having a refractive index, at 550 nm, of at least 1.7 onto said glass substrate (1), (c) firing the resulting frit coated glass substrate at a temperature above the Littleton temperature of the glass frit thereby forming a first high index enamel layer (4), (d) coating a metal oxide layer (2) onto said first high index enamel layer, (e) firing the resulting coated glass substrate at a temperature above the Littleton temperature of the glass frit, comprised between 530 °C and 620 °C, thereby making react the metal oxide (2) with the underlying first high index enamel layer (4) and forming a second high index enamel layer (5) with a plurality of spherical voids (6) embedded in the upper section of the second high index enamel layer (5) near the interface with air, and optionally (f) coating a transparent electro-conductive layer (TCL) (8) on the second high index enamel layer (5). |
