| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To inspect fine structure of an inspection object in a short time. <P>SOLUTION: A photomask 7 of the inspection object is illuminated by an illumination system 20 to generate diffraction light due to the photomask 7 with substantially uniform luminous energy over the whole face of an inspection area, an image-focusing optical system 8 provided with an objective lens is arranged in a position of making a prescribed degree or more of higher diffraction light out of the diffraction light selectively get incident, a light intensity distribution of an image of the photomask 7 by the objective lens is detected by a CCD camera 4, and a detection result therein is analyzed by an image processor 3 to acquire information about the fine structure of the photomask 7. The illumination by the illumination system 20 is preferably carried out therein by inclined light illumination. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
