| 摘要 |
<p>PURPOSE:To eliminate variance in forming a pattern, caused by various factors arising in a device and to accurately transfer a pattern by forming an exposing mask according to the quantity that an original pattern on an exposing mask and a pattern having been transferred and formed on an exposing plane are converted. CONSTITUTION:The same exposure plane is divided into plural parts, and the quantities that they are converted are obtained and mapped. According to the conversion quantities, the mask pattern is corrected and formed. Even if the pattern composed of each designed segment is different from the actually exposed and transferred pattern by using the former pattern, they can be corrected by the difference, that is, the conversion quantity to form the exposing mask. The obtained pattern is a prescribed one. Thus, variance in pattern transfer is eliminated to attain a proper pattern transfer.</p> |
