A process for adjusting the etching speed in the anisotropic plasma etching of lateral structures,申请号GB19990021482-传众专利搜索

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发明名称	A process for adjusting the etching speed in the anisotropic plasma etching of lateral structures
摘要
申请公布号	GB9921482(D0)	申请公布日期	1999.11.17
申请号	GB19990021482	申请日期	1999.09.10
申请人	ROBERT BOSCH GMBH	发明人
分类号	B81C1/00;H01L21/3065	主分类号	B81C1/00
代理机构		代理人
主权项
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