发明名称 Toestel voor meten van een brandpunt van een belichtingssysteem gebruikt voor vervaardiging van een halfgeleiderinrichting.
摘要 An apparatus for measuring a focus of semiconductor exposure equipment is provided to make an exposure region correspond to a focus measurement region on a photoresist substrate, by installing a transparent electrode in a slit of a focus measurement unit. The focus measurement unit(30) has a non-transparent region which light cannot transmit, a transparent region which light can transmit and the transparent electrode installed in the transparent region. The photoresist substrate(59) is supported by a stage(60). A capacitance measurement unit(61) measures capacitance between the transparent electrode and the stage while adopting the transparent electrode and the stage as both electrodes.
申请公布号 NL1018377(A1) 申请公布日期 2002.01.29
申请号 NL20011018377 申请日期 2001.06.25
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 YOUNG-CHANG KIM
分类号 H01L21/66;G03F7/20;G03F9/00 主分类号 H01L21/66
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