THIN FILM FABRICATEINGA PPARATUS USEING REMOTE PLASMA

摘要

A thin film-forming apparatus using remote plasma is provided to prevent defects from forming semiconductor thin films by preventing impurities from flowing in a reaction chamber. A thin film-forming apparatus(1) using remote plasma comprises a remote plasma generation part(100), a plasma storage part, and an impure radical purging part(160). The remote plasma generation part generates radical-included plasma. The plasma storage part stores the plasma generated in the remote plasma generation part. The impure radical purging part removes impure radicals from the radical-included plasma discharged from the plasma storage part.