PLASMA SUPPLY DEVICE

摘要

The invention relates to a plasma supply device (10, 10') for the generation of a power output > 500 W at a substantially constant base frequency > 3 MHz and for the power supply of a plasma process, to which the power output generated is supplied and from which power reflected is conducted back to the plasma supply device (10, 10') at least in the event of a maladjustment, having at least one inverter (11, 12), which is connected to a DC power supply (13, 14, 13', 14') and has at least one switching element (11.1, 11.2, 12.1, 12.2.), and having an output network (15, 15'), the output network (15, 15') being disposed on a circuit board (38). In this way, the output network (15, 15') can be implemented inexpensively and precisely.