发明名称 GROWTH METHOD OF GALLIUM NITRIDE-BASED SEMICONDUCTOR CRYSTAL
摘要 <p>PURPOSE: To obtain a GaN-based semiconductor crystal which is suitable for a blue light-emitting material and which is of good quality by providing a crystal growth method which is improved in such a way that rare-earth 3B perovskite is used as a substrate and that the (c) plane of the GaN-based semiconductor crystal can be grown stably on the 101} plane or the 011} plane of the substrate. CONSTITUTION: A substrate composed of NdGaO3 (neodymium gallate) having a plane orientation of (011) is used, a buffer layer which is composed of GaN formed by an MOCVD method at a temperature of 700 deg.C or lower or of ZnO or In2 O3 which is formed by an RF sputtering method is formed on the substrate, and a GaN-based semiconductor crystal is grown on it. Consequently, the (c) plane of the GaN-based semiconductor crystal is grown stably via the buffer layer on the 101} plane or the 011} plane of a rare-earth group 3B perovskite substrate which is lattice-matched with the GaN-based semiconductor crystal and which is thermally and chemically stable, and the GaN-based semiconductor crystal which is good as a blue light-emitting semiconductor material is obtained.</p>
申请公布号 JPH08186329(A) 申请公布日期 1996.07.16
申请号 JP19940328222 申请日期 1994.12.28
申请人 JAPAN ENERGY CORP 发明人 OKAZAKI HITOSHI;ONIYAMA HIDEYUKI
分类号 C30B29/38;C23C14/34;C23C16/02;C23C16/34;H01L21/203;H01L21/205;H01L33/12;H01L33/16;H01L33/32;H01S5/00;H01S5/323 主分类号 C30B29/38
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