发明名称 OBSERVATION APPARATUS AND METHOD USING ELECTRON BEAM
摘要 PROBLEM TO BE SOLVED: To provide an apparatus, a technique, and a method for two-dimensional distributions and measuring distortions and stress, having nanometer resolution of each type of crystal sample through the use of diffraction images observed by an electronic microscope. SOLUTION: Electron beams are irradiated in minute amount and in parallel to a sample. The distances, between the spots of a diffraction image reflecting a crystal structure acquired by the irradiation, are measured by an image detector or a position detector. A two-dimensional stress distribution is superimposed on the measured positional information and displayed on an enlarged image of an electronic microscope. Distortions and stresses in minute crystals can be displayed at a high resolution and at a high speed in matching structural information of the sample. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006153894(A) 申请公布日期 2006.06.15
申请号 JP20060058855 申请日期 2006.03.06
申请人 HITACHI LTD 发明人 TAKAGUCHI MASANARI;NAKAMURA KUNIYASU;UMEMURA KAORU;TANIGUCHI YOSHIFUMI;ICHIHASHI MIKIO
分类号 G01N23/20;H01J37/28 主分类号 G01N23/20
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