发明名称 Nonvolatile magnetic memory device and manufacturing method thereof
摘要 An TMR-type MRAM comprising a transistor for selection; a first connecting hole; a first wiring (write-in word line); a second insulating interlayer covering a first insulating interlayer and the first wiring; a TRM device formed on the second insulating interlayer; a second wiring (bit line) formed on a third insulating interlayer; and a second connecting hole formed through the second insulating interlayer and connected to the first connecting hole, in which an end face of an extending portion of the other end of the TRM device is in contact with the second connecting hole.
申请公布号 US7271010(B2) 申请公布日期 2007.09.18
申请号 US20050237138 申请日期 2005.09.28
申请人 SONY CORPORATION 发明人 MOTOYOSHI MAKOTO
分类号 H01L21/00;H01L27/105;G11C11/56;H01L21/4763;H01L21/768;H01L21/8246;H01L27/22;H01L43/08;H01L43/12 主分类号 H01L21/00
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