Resist underlayer film-forming composition containing aryl sulfonate salt having hydroxyl group

摘要

There is provided a resist underlayer film-forming composition to reduce the amount of sublimate generated from the resist underlayer film at baking process and to suppress aging and have high storage stability. A resist underlayer film-forming composition including an aryl sulfonic acid salt compound having a hydroxy group of Formula (1):;
(where Ar is a benzene ring or an aromatic hydrocarbon ring wherein benzene rings are condensed; m1 is an integer of 0 to (2+2n), m2 and m3 each is an integer of 1 to (3+2n), and (m1+m2+m3) is an integer of 2 to (4+2n), with the proviso that n is the number of the benzene rings or condensed benzene rings in the aromatic hydrocarbon ring and is an integer of 1 to 6; X+ is NH4+, a primary ammonium ion, secondary ammonium ion, tertiary ammonium ion, quaternary ammonium ion, sulfonium ion, or an iodonium cation).

主权项

1. A resist underlayer film-forming composition comprising an aryl sulfonic acid salt compound having a hydroxy group of Formula (1): (where Ar is a benzene ring or an aromatic hydrocarbon ring in which benzene rings are condensed; R1 each is a substituent of a hydrogen atom in the aromatic ring and is a nitro group, an amino group, a carboxy group, a halogen atom, a C1-10 alkoxy group, a C1-10 alkyl group, a C2-10 alkenyl group, a C6-40 aryl group, an organic group containing an ether bond, an organic group containing a ketone bond, an organic group containing an ester bond, or a group combining thereof; m1 is an integer of 0 to (2+2n), m2 and m3 each is an integer of 1 to (3+2n), and (m1+m2+m3) is an integer of 2 to (4+2n), with the proviso that n is the number of the benzene rings or the number of the condensed benzene rings in the aromatic hydrocarbon ring and is an integer of 1 to 6; X+ is NH4+, a primary ammonium ion, a secondary ammonium ion, a tertiary ammonium ion, a quaternary ammonium ion, a sulfonium ion, or an iodonium cation).