发明名称 Distortion quantifier for analyzing surfaces
摘要 This application relates to determining uniformity of a housing for a computing device based on characteristics of a reflected pattern of light incident upon the housing. The reflected pattern of light can include an array of shapes such as dots whose orientation and location can provide indications of uniformity for the housing. The array of shapes are analyzed to determine certain geometric properties such as area for each shape in the array of shapes. The geometric properties can thereafter be compared to a predetermined geometric, threshold, or tolerance value, and each shape can be assigned a rank of uniformity. Once a rank of uniformity is defined for each shape, a compilation of uniformity values can be generated and used to find portions on the housing where the housing is not uniform or flat.
申请公布号 US9429421(B2) 申请公布日期 2016.08.30
申请号 US201414446259 申请日期 2014.07.29
申请人 Apple Inc. 发明人 Kessler Patrick;Bakhshi Jason;Spriggs Katherine J.;Suri Akhil
分类号 G06T7/00;G01B11/25;H04N5/225 主分类号 G06T7/00
代理机构 Downey Brand LLP 代理人 Downey Brand LLP
主权项 1. A system for determining uniformity of a reflective surface, comprising: a computing device configured to perform image analysis; a light emitting device operatively coupled to the computing device, wherein the light emitting device is configured to emit an original pattern of light onto the reflective surface, the original pattern of light including an original array of disconnected dots that define a plurality of original polygons; and a light capturing device operatively coupled to the computing device, wherein the light capturing device is configured to receive at a receiving surface thereof a reflected pattern of light from the reflective surface, the reflected pattern of light including a reflected array of disconnected dots that define a plurality of reflected polygons corresponding to the plurality of original polygons, and wherein the computing device is configured to perform an image analysis on the reflected pattern of light in order to provide an estimate of surface uniformity for the reflective surface, wherein the image analysis includes calculating the area for each of the plurality of reflected polygons on the receiving surface.
地址 Cupertino CA US