| 摘要 |
A description is given of a photopolymerisable composition which contains a) a graft copolymer whose graft base is a polyurethane having grafted-on chains containing vinyl alcohol and vinyl acetal units, b) a free-radical-polymerisable compound containing at least one terminal ethylenically unsaturated group and having a boiling point at normal pressure above 100 DEG C, and c) a compound or a combination of compounds which is able to initiate the polymerisation of the compound (b) on exposure to actinic light. The composition is suitable for producing printing plates and photoresists, it is remarkable for high photosensitivity and it can be developed with aqueous solutions. It produces printing plates with a long print run. |
