| 摘要 |
<p>PURPOSE: To provide a method of manufacturing a high contrast X-ray mask without misregistration between the pattern of the high contrast X-ray mask, of which manufacturing process is simple and complete and an initial design pattern. CONSTITUTION: The method of manufacturing the high contrast X-ray pattern comprises the formation of X-ray absorbing material thin film pattern 3 on a side of a supporting film 2, the application of thick film resist 4 on the other side of the supporting film, the irradiation of the thick film resist 4 with X-rays through X-ray absorbing material thin film pattern 3 and the supporting film 2, the formation of a deep groove pattern 4A that corresponds to the X-ray absorbing material thin film pattern inside the thick film resist by developing the thick film resist 4, the formation of an X-ray absorbing material thick film pattern 5 so that it fills in the deep groove pattern 4A and the removal of the thick film resist 4.</p> |
