发明名称 Method for cutting substrate of irregular pattern and display device
摘要 A method for cutting a substrate of irregular pattern includes: forming a cutting line on the substrate, wherein the closed region enclosed by the cutting line is the irregular pattern that is required; forming a trough line at the cutting line; and applying an external force to the substrate so as to divide the substrate at the trough line. The method can remarkably improve accuracy and efficiency of cutting a substrate of irregular pattern.
申请公布号 US9416041(B2) 申请公布日期 2016.08.16
申请号 US201314347138 申请日期 2013.10.15
申请人 BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.;BOE TECHNOLOGY GROUP CO., LTD. 发明人 Jiang Liyuan;Zheng Yaokun;Qu Lianjie;Wang Yajie;Jiang Yanqi
分类号 C03B33/02;B23K26/36;C03C15/00;B26F3/00;C03B33/07;B23K26/40;C03B33/04 主分类号 C03B33/02
代理机构 Ladas & Parry LLP 代理人 Ladas & Parry LLP
主权项 1. A method for cutting a substrate of irregular pattern, comprising: forming a cutting line on the substrate, wherein a closed region enclosed by the cutting line is the irregular pattern that is required; forming a trough line at the cutting line through an etching process; and applying an external force onto the substrate so as to divide the substrate at the trough line, wherein the external force is applied on the substrate through ultrasonic wave to cut the substrate at the trough line formed by the etching process.
地址 Beijing CN