发明名称 Pressure measuring instrument and substrate processing apparatus provided with the pressure measuring instrument
摘要 There is provided a pressure measuring instrument including: a detecting unit including the reference pressure chamber therein and formed in a cylindrical shape, the diaphragm being disposed inside the detecting unit; a communicating unit for providing communication between the diaphragm and the measurement pressure chamber, and formed in a circular tube shape having an inner diameter smaller than an inner diameter of the detecting unit; and an annular flow-path forming unit disposed between the detecting unit and the communicating unit, and configured to form a substantially annular path. The communicating unit introduces a gas of the measurement pressure chamber into the substantially annular path. The annular flow-path forming unit allows the gas introduced from the communicating unit to pass through the substantially annular path and to supply the passing gas to a side surface of the diaphragm.
申请公布号 US9360390(B2) 申请公布日期 2016.06.07
申请号 US201414150457 申请日期 2014.01.08
申请人 TOKYO ELECTRON LIMITED 发明人 Koike Satoru
分类号 G01L9/00;G01L19/14;G01L19/06 主分类号 G01L9/00
代理机构 Nath, Goldberg & Meyer 代理人 Nath, Goldberg & Meyer ;Meyer Jerald L.
主权项 1. A pressure measuring instrument that, using a diaphragm disposed between a reference pressure chamber and a measurement pressure chamber, detects a deformation of the diaphragm and consequently measures a pressure of the measurement pressure chamber, the pressure measuring instrument comprising: a detecting unit including the reference pressure chamber therein and formed in a cylindrical shape, the diaphragm being disposed inside the detecting unit; a communicating unit for providing communication between the diaphragm and the measurement pressure chamber, and formed in a circular tube shape having an inner diameter smaller than an inner diameter of the detecting unit; and an annular flow-path forming unit disposed between the detecting unit and the communicating unit, and configured to form a substantially annular path, wherein the communicating unit configured to introduce a gas of the measurement pressure chamber into the substantially annular path, the annular flow-path forming unit configured to allow the gas introduced from the communicating unit to pass through the substantially annular path and to supply the passing gas to a side surface of the diaphragm, and the substantially annular path is formed at a location opposite to a location at which a differential value dH of a displacement H per unit area of the diaphragm reaches a peak, while the substantially annular path being not formed at a location opposite to a location at which a differential value dH of a displacement H per unit area of the diaphragm is 0.
地址 Tokyo JP