发明名称 Wide band gap semiconductor device
摘要 A semiconductor device having high reliability and high load short circuit withstand capability while maintaining a low ON resistance is provided, by using a WBG semiconductor as a switching element of an inverter circuit. In the semiconductor device for application to a switching element of an inverter circuit, a band gap of a semiconductor material is wider than that of silicon, a circuit that limits a current when a main transistor is short circuited is provided, and the main transistor that mainly serves to pass a current, a sensing transistor that is connected in parallel to the main transistor and detects a microcurrent proportional to a current flowing in the main transistor, and a lateral MOSFET that controls a gate of the main transistor on the basis of an output of the sensing transistor are formed on the same semiconductor.
申请公布号 US9450084(B2) 申请公布日期 2016.09.20
申请号 US201012718514 申请日期 2010.03.05
申请人 FUJI ELECTRIC SYSTEMS CO. LTD. 发明人 Ueno Katsunori
分类号 H01L29/78;H01L29/16;H01L29/20;H02M7/00 主分类号 H01L29/78
代理机构 Rossi, Kimms & McDowell LLP 代理人 Rossi, Kimms & McDowell LLP
主权项 1. A wide band gap semiconductor device for application to a switching element of an inverter circuit, the device comprising: a main transistor; a sensing transistor connected in parallel to the main transistor that detects a microcurrent proportional to a current flowing in the main transistor; and a lateral MOSFET that controls a gate of the main transistor on the basis of an output of the sensing transistor; wherein the main transistor, the sensing transistor and the lateral MOSFET are all formed on the same semiconductor substrate; wherein a band gap of the semiconductor substrate is wider than that of silicon; and wherein the main transistor and the sensing transistor each include a gate structure formed in a trench groove, and a surface dopant concentration of a p-well is set to be lower than a dopant concentration at a predetermined depth of the p-well below the surface of the p-well, and wherein the dopant concentration of the p-well continuously increases in accordance with the depth of the p-well, from the surface of the p-well, to the predetermined depth.
地址 Kawasaki-shi JP
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