发明名称 |
Wide band gap semiconductor device |
摘要 |
A semiconductor device having high reliability and high load short circuit withstand capability while maintaining a low ON resistance is provided, by using a WBG semiconductor as a switching element of an inverter circuit. In the semiconductor device for application to a switching element of an inverter circuit, a band gap of a semiconductor material is wider than that of silicon, a circuit that limits a current when a main transistor is short circuited is provided, and the main transistor that mainly serves to pass a current, a sensing transistor that is connected in parallel to the main transistor and detects a microcurrent proportional to a current flowing in the main transistor, and a lateral MOSFET that controls a gate of the main transistor on the basis of an output of the sensing transistor are formed on the same semiconductor. |
申请公布号 |
US9450084(B2) |
申请公布日期 |
2016.09.20 |
申请号 |
US201012718514 |
申请日期 |
2010.03.05 |
申请人 |
FUJI ELECTRIC SYSTEMS CO. LTD. |
发明人 |
Ueno Katsunori |
分类号 |
H01L29/78;H01L29/16;H01L29/20;H02M7/00 |
主分类号 |
H01L29/78 |
代理机构 |
Rossi, Kimms & McDowell LLP |
代理人 |
Rossi, Kimms & McDowell LLP |
主权项 |
1. A wide band gap semiconductor device for application to a switching element of an inverter circuit, the device comprising:
a main transistor; a sensing transistor connected in parallel to the main transistor that detects a microcurrent proportional to a current flowing in the main transistor; and a lateral MOSFET that controls a gate of the main transistor on the basis of an output of the sensing transistor; wherein the main transistor, the sensing transistor and the lateral MOSFET are all formed on the same semiconductor substrate; wherein a band gap of the semiconductor substrate is wider than that of silicon; and wherein the main transistor and the sensing transistor each include a gate structure formed in a trench groove, and a surface dopant concentration of a p-well is set to be lower than a dopant concentration at a predetermined depth of the p-well below the surface of the p-well, and wherein the dopant concentration of the p-well continuously increases in accordance with the depth of the p-well, from the surface of the p-well, to the predetermined depth. |
地址 |
Kawasaki-shi JP |