| 摘要 |
<p>PURPOSE:To provide a color filter which has desirable spectral characteristics, and is made usable in fields where high accuracy is required by so forming the same that the color filter elements forming the same color areas have the 2nd colored layer compensating the spectral characteristics of the 1st colored layer. CONSTITUTION:The 1st colored layer 32 and the 2nd colored layer 33 are installed on a transparent substrate 31 at the respective film thicknesses which are determined by their respective spectral characteristics and requested spectral characteristics. Thence, a photoresist 34 for the purpose of patterning is coated by a spinner on the layers 32 and 33 laminated on the substrate 31. Thence, it is exposed and developed at the prescribed patterns, thereby forming mask 35 for etching. The parts not covered by this mask 35 are etched off, whereby the colored layers are pattened and color filter elements 36 are formed. The patterning for the 2nd and subsequent colors is accomplished in the same manner as mentioned above, whereby respective color filters 36' and 36'' are formed. The color filters having undergone final patterning permit installation of a transparent and hard overcoating layer 37 on the surface thereof.</p> |
