发明名称 RESIST COMPOSITION AND PROCESS FOR PRODUCING SAME
摘要 A resist composition that includes an organic solvent (S) and a base material component dissolved in the organic solvent (S), wherein the organic solvent (S) contains ethyl lactate and an antioxidant, and the concentration of the antioxidant within the organic solvent (S) is 10 ppm or greater.
申请公布号 US2009155713(A1) 申请公布日期 2009.06.18
申请号 US20060097866 申请日期 2006.12.11
申请人 TOKYO OHKA KOGYO CO., LTD. 发明人 MIYANO TORU;TAKAHASHI RYUSAKU;SAMEZAWA MOTOKO;MUROI MASAAKI;KANNO KOJI
分类号 G03F7/004 主分类号 G03F7/004
代理机构 代理人
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