发明名称 |
RESIST COMPOSITION AND PROCESS FOR PRODUCING SAME |
摘要 |
A resist composition that includes an organic solvent (S) and a base material component dissolved in the organic solvent (S), wherein the organic solvent (S) contains ethyl lactate and an antioxidant, and the concentration of the antioxidant within the organic solvent (S) is 10 ppm or greater.
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申请公布号 |
US2009155713(A1) |
申请公布日期 |
2009.06.18 |
申请号 |
US20060097866 |
申请日期 |
2006.12.11 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
MIYANO TORU;TAKAHASHI RYUSAKU;SAMEZAWA MOTOKO;MUROI MASAAKI;KANNO KOJI |
分类号 |
G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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