| 摘要 |
A semiconductor memory device includes a plurality of word lines and a plurality of bit lines arranged perpendicular to each other. Memory cells are located at the cross position between each word line and each bit line, and one of the bit lines is selected by the operation of a bit line selection transistor driven by the signal of a column decoder. The bit line selection transistors are separated into a plurality of blocks corresponding to each bit line group, and the bit line selection transistors in each block are arranged along the direction of the bit line. Further, the gates of the bit line selection transistors are arranged perpendicular to the direction of the bit lines, and the gates of the bit line selection transistors are commonly connected to the gates of the corresponding bit line selection transistors in the adjoining bit line selection transistor blocks. Thus, the pitch between transistor blocks is reduced, the pattern of the bit lines is made denser, and the integration density of the semiconductor memory device is increased.
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