发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURE
摘要 PURPOSE:To enable the epitaxial growth of wurtzite crystal onto a zincblende crystal substrate by providing it with a heterojunction build-up part where strain superlattice layer consisting of two or more kinds of II-IV compound semiconductors is formed directly on a substrate. CONSTITUTION:Using a decompressed MOCVD method, a high quality of ZnCdS- ZnS strain superlattice, which exhibits notable quantum confinement effect, is formed directly on a semiconductor substrate of CaAs, or the like. In this semiconductor device, it can be performed naturally to make use of the II-IV compound semiconductor strain superlattice formed directly on the semiconductor substrate, as a nonlinear optical active layer. By forming the distorted superlattice heterojunction build-up layer of II-IV compound semiconductor directly on the semiconductor substrate this way, a good quality of epitaxial growth crystal can be attained.
申请公布号 JPH0429332(A) 申请公布日期 1992.01.31
申请号 JP19900134028 申请日期 1990.05.25
申请人 SHOWA DENKO KK;TAGUCHI TSUNEMASA 发明人 YASHIMA HIDEO;TAGUCHI TSUNEMASA
分类号 G02F1/35;G02F1/355;H01L21/365;H01L21/822;H01L27/04;H01L33/06;H01L33/16;H01L33/28;H01L33/30;H01L33/34;H01S5/00 主分类号 G02F1/35
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