| 摘要 |
<p>PURPOSE:To obtain the title substrate excellent in the control of the differentiated form of neurocytes by forming a photoresist pattern on a plastic substrate followed by specific treatments including ammonia plasma treatment. CONSTITUTION:Firstly, a radial pattern of a positive-type photoresist of novolak- diazoquinone type is formed on a plastic substrate such as polyethersulfone. Second, the resulting substrate is put to low-temperature ammonia plasma treatment to introduce amino group into its surface. Third, the resulting substrate is reacted with an aqueous glutaraldehyde solution at room temperature and then rinsed to remove excess water. Thence, a cell-adhesive protein solution prepared by dissolving e.g. laminin in a physiological buffer solution is dripped onto the substrate surface to effect coating. Finally, to remove the resulting photoresist, the substrate is immersed in ethanol or methanol and put to ultrasonic cleaning, and then rinsed with demineralized water and preserved stably in an acid salt buffer solution; thereby, neurocyte differentiation can be definitely controlled.</p> |
