| 摘要 |
PURPOSE:To obtain photoresist without coloring by using a vapor deposited film of silicon monoxide as a protective film for the transparent conductive film on a display electrode side and using positive photoresist for patterning. CONSTITUTION:This invention relates to a method for producing the display electrode of an electrochromic display element using transition metallic oxide of tungsten oxide, etc. as a color developing material. The display element is constituted of a glass substrate 1 on the display side, a transparent conductor 2, a color developing material layer 3, a protective film 4 of a transparent conductor formed on a vapor deposited film or the like of SiO, an electrolyte 5, a counter electrode 6, a glass substrate 7, a spacer 8 and a background material 9 inserted in the electrode. If the colorless and transparent vapor deposited film of SiO is formed by using OMR83 which is negative type photoresist of, for example, cyclized rubber, and if said film is patterned by selective etching with an etching soln. contg. hydrofluoric acid and is removed again with the photoresist, said film colors to yellow but if phenol and novolak of positive type are used for the photoresist, the film does not color. |
