发明名称 |
Gas supplying system and gas supplying apparatus |
摘要 |
A gas supplying system for supplying a corrosive gas or the like to a semiconductor manufacturing apparatus or the like. A plurality of kinds of component gases are introduced into a chamber and mixed therein to form a desired supply gas. After supplying the desired supply gas, the chamber is evacuated and an inert gas is charged into the chamber to substitute a residual supply gas remaining in the chamber by the inert gas. The evacuation of the chamber and the charging of the inert gas into the chamber are repeated two or more times. Accordingly, the residual supply gas can be efficiently removed from the chamber and substituted by the inert gas. |
申请公布号 |
US5368062(A) |
申请公布日期 |
1994.11.29 |
申请号 |
US19930010325 |
申请日期 |
1993.01.28 |
申请人 |
KABUSHIKI KAISHA TOSHIBA;CKD CORPORATION |
发明人 |
OKUMURA, KATSUYA;SUDO, YOSHIHISA;GOSHIMA, KENICHI;ITAFUJI, HIROSHI;KOJIMA, AKIHIRO |
分类号 |
C23C16/44;C23C16/455;F17C5/06;(IPC1-7):F16K11/20 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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