| 摘要 |
PROBLEM TO BE SOLVED: To obtain a synthetic quartz glass member almost free from a sulfurous impurity and suitable for an optical use with UV of excimer laser or the like as a light source by previously removing the sulfurous impurity from a silane compd. as a starting material. SOLUTION: A silane compd. is vaporized, the resultant vapor is hydrolyzed or burned and oxidized in an oxyhydrogen flame to form fine silica particles and these particles are deposited and melted on a rotating heat resistant substrate to produce the objective synthetic quartz glass member. A sulfurous impurity in the starting material is sulfur chloride and is previously removed to <=10 ppm. The silane compd. is represented by formula I [where R is H or an aliphatic hydrocarbon, X is halogen or -OR and (n) is an integer of 0-3] of formula II [where R is H or an aliphatic hydrocarbon, (x) is an integer of >=2, (y) is an integer of <=(2x+2) and (z) is an integer of <=2x]. The synthetic quartz glass member contg. no sulfurous impurity does not emit yellow fluorescence of 560-580 nm wavelength even when irradiated with high energy UV rays of excimer laser or the like. |
