| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner in which an illumination optical system can be adjusted accurately in a short time. SOLUTION: A reticle R is irradiated with an exposing light IL from an exposing light source 1 through an illumination optical system ILS comprising a first fly eye lens 6, a second fly eye lens 9, lens systems 12, 13 blinds 14A, 14B, and condenser lens systems 17, 18 and the pattern image of the reticle R is projected onto a wafer W through a projection optical system PL. Specific illumination characteristics are measured using an evaluation mark plate 33 on a reticle stage 31, and a spatial image measuring system 46 provided on a wafer state 39 and then the state of the second fly eye lens 9 and the lens systems 12, 13 is adjusted through drive units 23, 24 and 25 based on the measurements. |
