发明名称 LED with radiation surface restricted by ion implantation - has substrate transparent to radiation and has refraction structure at emitting surface
摘要 <p>The diode emits light according to the Lambert law. Galium arsenide is used as a starting material for the substrate epitaxi. The basic semiconductor material is transparent for the generated radiation. Its surface for the radiation output has a defractive and/or refractive structure. The dimensions of the structure, in relation to the locally different impinging angle of the spatially angular radiation provides outwards parallel radiation. The structure is preferably deposited in the semiconductor substrate, which serves as a support for different materials whose expansion coefficient matches the substrate material as far as the radiation transparency and refractive index are concerned.</p>
申请公布号 DE2727508(A1) 申请公布日期 1979.01.04
申请号 DE19772727508 申请日期 1977.06.18
申请人 SIEMENS AG 发明人 HAEHNLEIN,ALFONS,DIPL.-PHYS.
分类号 H01L33/20;(IPC1-7):01L33/00 主分类号 H01L33/20
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