发明名称 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND COMPUTER READABLE STORAGE MEDIUM
摘要 <p>A substrate processing apparatus, a substrate processing method, and a computer readable storage medium are provided to suppress a dropping effect of treatment solution from a substrate by absorbing and collecting efficiently the treatment solution. A substrate processing unit processes a substrate(G) by using a treatment solution. A transferring path(5) transfers the substrate while a processing target surface of the substrate is directed upwardly. A treatment solution supply unit(67) supplies the treatment solution onto the substrate. A treatment solution absorbing unit(65) absorbs the treatment solution from the substrate to be transferred through the transferring path. A chasm-shaped bend part is used for changing a tilt angle of a transferring direction in order to bend the substrate in the transferring path. The treatment solution supply unit supplies the treatment solution at a position higher than a position of the chasm-shaped bend part. The treatment solution absorbing unit absorbs the treatment solution at the position of the chasm-shaped bend part or a peripheral position of the chasm-shaped bend part.</p>
申请公布号 KR20070093343(A) 申请公布日期 2007.09.18
申请号 KR20070023805 申请日期 2007.03.12
申请人 TOKYO ELECTRON LIMITED 发明人 TAKEKUMA TAKASHI
分类号 H01L21/027;B65G49/06;G02F1/13;G03F7/30 主分类号 H01L21/027
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