MARKER STRUCTURE FOR LITHOGRAPHY, LITHOGRAPHIC PROJECTION APPARATUS INCLUDING SUCH MARKER STRUCTURE, AND METHOD FOR SUBSTRATE ALIGNMENT USING SUCH A MARKER STRUCTURE

摘要

PROBLEM TO BE SOLVED: To provide a marker structure on a substrate for optical alignment of the substrate including a plurality of first structural elements and a plurality of second structural elements.

SOLUTION: For use, the marker structure enables optical alignment by providing at least one light beam directed on the marker structure, detecting light received from the marker structure via a sensor, and obtaining alignment information from the detected light, the alignment information including information relating a substrate position to the sensor.

COPYRIGHT: (C)2008,JPO&INPIT