| 发明名称 |
PROCESS FOR THE MANUFACTURE OF FILMS AND RELIEF PICTURES FROM POLYIMIDES |
| 摘要 |
<p>Polyimides which essentially consist of 0.1 to 100 mol % of at least one structural element of the formula I <IMAGE> (I) and 99.9 to 0 mol % of at least one structural element of the fomula II and/or III <IMAGE> (II) <IMAGE> (III) in which and Z' are a tetravalent aromatic radical, Q' is a trivalent aromatic radical, X and X' are a divalent radical of an organic amine are autophotocrosslinkable. They are suitable for the production of protective films and photographic relief images.</p> |
| 申请公布号 |
EP0181837(B1) |
申请公布日期 |
1991.01.02 |
| 申请号 |
EP19850810527 |
申请日期 |
1985.11.11 |
| 申请人 |
CIBA-GEIGY AG |
发明人 |
PFEIFER, JOSEF, DR.;DUTHALER, RUDOLF, DR. |
| 分类号 |
C08G73/00;C07C63/04;C07C65/34;C07C65/40;C07C233/87;C07C255/56;C07D209/48;C07D219/06;C07D311/86;C07D335/16;C07D493/14;C07D495/14;C07D497/14;C08G73/10;C08J5/18;C09D179/08;G02F1/1333;G03F7/038;G03F7/075 |
主分类号 |
C08G73/00 |
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