| 摘要 |
<p>PURPOSE:To replenish the molten metal in a crucible in a short period of time without breaking the vacuum in a vapor deposition chamber and to improve the working rate of a vacuum evaporation device by connecting the crucible for the metal to be deposited by evaporation in the vacuum evaporation chamber of the vacuum evaporation device to a molten metal replenishing tank by a pipe. CONSTITUTION:The molten metal 18a in the crucible 11 provided in the vacuum evaporation chamber 12 is heated by a deflected electron beam 25 from an electron gun 15 to generate metal vapor 26 and to form the vapor deposited film of the metal on a substrate. The molten metal 18a in the replenishing tank 13 is supplied via a pipe 14 into the crucible 11 to replenish the molten metal when the molten metal 18a in the crucible 11 decreases. The replenishing tank 13 is constituted of a preliminary tank chamber 20 having a lower cap 21a, a lower cap 21b and pressure controllers 22a, 22b and a tank chamber 19. The solid metal 18b is transferred from the preliminary tank chamber 20 to the tank chamber 19 while the pressure in the two chambers 20, 19 is regulated. The metal is then heated and melted by a heater 23 to form the molten metal 18a. There is no need for breaking the vacuum of the vacuum evaporation chamber at the time of replenishing the molten metal into the crucible 11 and, therefore, the working rate of the vacuum evaporation device is greatly improved.</p> |
