发明名称 |
Method and apparatus for real-time, in-situ endpoint detection and closed loop etch process control |
摘要 |
A method and apparatus for detecting an etching endpoint of a film on a substrate whereby a first excitation beam of light having a prescribed wavelength is provided, the first light beam substantially containing only a first harmonic component of light at that wavelength. The first light beam is directed at a prescribed incident angle to an interface between the film and the substrate, the first light beam being reflected off the interface to thereby provide a second light beam, the second light beam containing the first harmonic component of the first light beam and a generated second harmonic component. The generated second harmonic component is detected and a first output signal representative thereof is provided. A generated second harmonic component reference of the first light beam is produced and a second output signal representative of a generated second harmonic component reference is provided. The detected second harmonic component of the first light beam is normalized, as a function of the first and second output signals, in real-time, and a third output signal representative of an occurrence of a prescribed change in the normalized detected second harmonic component is provided. The prescribed change corresponds to the etching endpoint of the film on the substrate.
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申请公布号 |
US5392124(A) |
申请公布日期 |
1995.02.21 |
申请号 |
US19930169876 |
申请日期 |
1993.12.17 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BARBEE, STEVEN G.;HEINZ, TONY F.;HOEFER, ULRICH;LI, LEPING;SILVESTRI, VICTOR J. |
分类号 |
G01B11/06;G01N21/00;G01N21/45;H01L21/302;H01L21/306;H01L21/3065;(IPC1-7):G01B11/06 |
主分类号 |
G01B11/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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