发明名称 |
THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MAKING THIN FILM TRANSISTOR SUBSTRATE |
摘要 |
A thin film transistor substrate and a method for manufacturing a thin film transistor substrate are provided to flatten an organic semiconductor layer of a thin film transistor substrate by forming a partition wall of a fluoric high polymer. A thin film transistor substrate(1) includes an insulation substrate(10). Source and drain electrodes(31,32) are formed on the insulation substrate, separately arranged on other sides of a channel area. A partition wall(41) covers the channel area, partially exposing the source and drain electrodes, and formed of a fluoric high polymer material. An organic semiconductor layer(51) is formed in the partition wall.
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申请公布号 |
KR20070013888(A) |
申请公布日期 |
2007.01.31 |
申请号 |
KR20050068553 |
申请日期 |
2005.07.27 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, YONG UK;OH, JOON HAK;HONG, MUN PYO;KIM, BO SUNG |
分类号 |
G02F1/136 |
主分类号 |
G02F1/136 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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