发明名称 THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MAKING THIN FILM TRANSISTOR SUBSTRATE
摘要 A thin film transistor substrate and a method for manufacturing a thin film transistor substrate are provided to flatten an organic semiconductor layer of a thin film transistor substrate by forming a partition wall of a fluoric high polymer. A thin film transistor substrate(1) includes an insulation substrate(10). Source and drain electrodes(31,32) are formed on the insulation substrate, separately arranged on other sides of a channel area. A partition wall(41) covers the channel area, partially exposing the source and drain electrodes, and formed of a fluoric high polymer material. An organic semiconductor layer(51) is formed in the partition wall.
申请公布号 KR20070013888(A) 申请公布日期 2007.01.31
申请号 KR20050068553 申请日期 2005.07.27
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, YONG UK;OH, JOON HAK;HONG, MUN PYO;KIM, BO SUNG
分类号 G02F1/136 主分类号 G02F1/136
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