发明名称 OBSERVED SAMPLE PROCESSING METHOD
摘要 PURPOSE:To prevent a substrate from being charged electrostatically with an electron beam which is projected from a scanning electron microscope by covering the surface of at lest the insulation part of the pattern and substrate of a sample with a conductive thin film which can be peeled with water, a solvent, etc. CONSTITUTION:When the sample 3 is constituted by forming the fine pattern 2 of a conductor on the surface of the substrate 1 made of an insulator, the surface of the sample 3 on the side of the pattern 2 is covered with the conductive thin film 4 which can easily be peeled off with a solvent, etc. Consequently, the substrate 1 can be prevented from being charged electrostatically with the electron beam which is projected from the scanning electron microscope. Therefore, an accurate image having no distortion can be observed without lowering the acceleration voltage of the electron beam of the electron microscope. The conductive thin film 4 can easily be peeled off with the solvent after the observation is performed through the microscope.
申请公布号 JPH01221637(A) 申请公布日期 1989.09.05
申请号 JP19880047200 申请日期 1988.02.29
申请人 HOYA CORP 发明人 SHINDO AKINORI
分类号 G01N1/28;G01R31/302;G03C5/00;G03F7/00;G03F7/26;H01L21/027;H01L21/30;H01L21/66 主分类号 G01N1/28
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